Novel exceptional high reflective index photoactive compound for optical applications
A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate...
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creator | IHAS BENJAMIN C PHAN XUAN T SETTHACHAYANON SONGVIT MICHAELS MARK DAVID |
description | A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used. |
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The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used.</description><edition>7</edition><language>eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20031204&DB=EPODOC&CC=US&NR=2003224250A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20031204&DB=EPODOC&CC=US&NR=2003224250A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>IHAS BENJAMIN C</creatorcontrib><creatorcontrib>PHAN XUAN T</creatorcontrib><creatorcontrib>SETTHACHAYANON SONGVIT</creatorcontrib><creatorcontrib>MICHAELS MARK DAVID</creatorcontrib><title>Novel exceptional high reflective index photoactive compound for optical applications</title><description>A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjEEKwjAURLtxIeodPrgWYqoHEFFcudGuS0gnNhDzP00sPb4RPYCrGYb3Zl41Vx4RCJOFZM_RBOr9o6cBLsBmP4J87DCR9JzZfBfLT-FX7MjxQFw8WzQjEkr5nKRlNXMmJKx-uajW59P9eNlAuEUSYxGR2-amlaq13um9Omzr_6g3N5E6_g</recordid><startdate>20031204</startdate><enddate>20031204</enddate><creator>IHAS BENJAMIN C</creator><creator>PHAN XUAN T</creator><creator>SETTHACHAYANON SONGVIT</creator><creator>MICHAELS MARK DAVID</creator><scope>EVB</scope></search><sort><creationdate>20031204</creationdate><title>Novel exceptional high reflective index photoactive compound for optical applications</title><author>IHAS BENJAMIN C ; PHAN XUAN T ; SETTHACHAYANON SONGVIT ; MICHAELS MARK DAVID</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2003224250A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>IHAS BENJAMIN C</creatorcontrib><creatorcontrib>PHAN XUAN T</creatorcontrib><creatorcontrib>SETTHACHAYANON SONGVIT</creatorcontrib><creatorcontrib>MICHAELS MARK DAVID</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>IHAS BENJAMIN C</au><au>PHAN XUAN T</au><au>SETTHACHAYANON SONGVIT</au><au>MICHAELS MARK DAVID</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Novel exceptional high reflective index photoactive compound for optical applications</title><date>2003-12-04</date><risdate>2003</risdate><abstract>A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
title | Novel exceptional high reflective index photoactive compound for optical applications |
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