Apparatus and method for pretreating effluent gases in a wet environment

Apparatus and method for pretreating effluent gases in a wet environment

An apparatus and method for wet pre-treatment of an effluent gas derived from upstream semiconductor or LCD manufacturing tools before the effluent gas is processed in an effluent gas treatment system in provided. The apparatus comprises an atomizing spray nozzle for atomizing a reagent and a proces...

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Hauptverfasser: OH YUN HAG, JEONG CHANG WOOK, YIM BYUNG KWON, LEE MAN SU, LEE GEUN SIK, LEE BYUNG IL, JUNG SUNG JIN, YOON TAE SANG
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Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEMICONDUCTOR DEVICES
SEPARATION
TRANSPORTING
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creator OH YUN HAG
JEONG CHANG WOOK
YIM BYUNG KWON
LEE MAN SU
LEE GEUN SIK
LEE BYUNG IL
JUNG SUNG JIN
YOON TAE SANG
description An apparatus and method for wet pre-treatment of an effluent gas derived from upstream semiconductor or LCD manufacturing tools before the effluent gas is processed in an effluent gas treatment system in provided. The apparatus comprises an atomizing spray nozzle for atomizing a reagent and a processing section in which the effluent gas in pre-treated with the atomized reagent using a cyclone method. The processing section comprises an inner tubular portion and an outer tubular portion. The processing section has an effluent gas inlet, a reagent inlet, an effluent gas outlet, and a waste liquid outlet. An apparatus is also provided which includes a plurality of wet pre-treatment units, each of which pre-treat each of effluent gas streams derived from a plurality of CVD chambers.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEMICONDUCTOR DEVICES
SEPARATION
TRANSPORTING
title Apparatus and method for pretreating effluent gases in a wet environment
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