Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber
The present invention relates to novel heaters and methods of heating a vacuum chamber, such as a semiconductor wafer plasma processing chamber, using a ceramic igniter array consisting of a plurality of ceramic igniters positioned in a substrate.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The present invention relates to novel heaters and methods of heating a vacuum chamber, such as a semiconductor wafer plasma processing chamber, using a ceramic igniter array consisting of a plurality of ceramic igniters positioned in a substrate. |
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