Use of a composition in stereolithography
The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a ster...
Gespeichert in:
Hauptverfasser: | , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | BLACKWOOD KEITH M GOODBY JOHN W HALL ALAN W BANNISTER ROBERT W MILNE PAUL E Y HEATH RYAN M BIGGS ANDREW G |
description | The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2003157435A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2003157435A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2003157435A13</originalsourceid><addsrcrecordid>eNrjZNAMLU5VyE9TSFRIzs8tyC_OLMnMz1PIzFMoLkktSs3PySzJyE8vSizIqORhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGBsaGpuYmxqaOhsbEqQIArFIpyw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Use of a composition in stereolithography</title><source>esp@cenet</source><creator>BLACKWOOD KEITH M ; GOODBY JOHN W ; HALL ALAN W ; BANNISTER ROBERT W ; MILNE PAUL E Y ; HEATH RYAN M ; BIGGS ANDREW G</creator><creatorcontrib>BLACKWOOD KEITH M ; GOODBY JOHN W ; HALL ALAN W ; BANNISTER ROBERT W ; MILNE PAUL E Y ; HEATH RYAN M ; BIGGS ANDREW G</creatorcontrib><description>The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.</description><edition>7</edition><language>eng</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; APPARATUS SPECIALLY ADAPTED THEREFOR ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HETEROCYCLIC COMPOUNDS ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030821&DB=EPODOC&CC=US&NR=2003157435A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030821&DB=EPODOC&CC=US&NR=2003157435A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BLACKWOOD KEITH M</creatorcontrib><creatorcontrib>GOODBY JOHN W</creatorcontrib><creatorcontrib>HALL ALAN W</creatorcontrib><creatorcontrib>BANNISTER ROBERT W</creatorcontrib><creatorcontrib>MILNE PAUL E Y</creatorcontrib><creatorcontrib>HEATH RYAN M</creatorcontrib><creatorcontrib>BIGGS ANDREW G</creatorcontrib><title>Use of a composition in stereolithography</title><description>The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAMLU5VyE9TSFRIzs8tyC_OLMnMz1PIzFMoLkktSs3PySzJyE8vSizIqORhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGBsaGpuYmxqaOhsbEqQIArFIpyw</recordid><startdate>20030821</startdate><enddate>20030821</enddate><creator>BLACKWOOD KEITH M</creator><creator>GOODBY JOHN W</creator><creator>HALL ALAN W</creator><creator>BANNISTER ROBERT W</creator><creator>MILNE PAUL E Y</creator><creator>HEATH RYAN M</creator><creator>BIGGS ANDREW G</creator><scope>EVB</scope></search><sort><creationdate>20030821</creationdate><title>Use of a composition in stereolithography</title><author>BLACKWOOD KEITH M ; GOODBY JOHN W ; HALL ALAN W ; BANNISTER ROBERT W ; MILNE PAUL E Y ; HEATH RYAN M ; BIGGS ANDREW G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2003157435A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>BLACKWOOD KEITH M</creatorcontrib><creatorcontrib>GOODBY JOHN W</creatorcontrib><creatorcontrib>HALL ALAN W</creatorcontrib><creatorcontrib>BANNISTER ROBERT W</creatorcontrib><creatorcontrib>MILNE PAUL E Y</creatorcontrib><creatorcontrib>HEATH RYAN M</creatorcontrib><creatorcontrib>BIGGS ANDREW G</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BLACKWOOD KEITH M</au><au>GOODBY JOHN W</au><au>HALL ALAN W</au><au>BANNISTER ROBERT W</au><au>MILNE PAUL E Y</au><au>HEATH RYAN M</au><au>BIGGS ANDREW G</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Use of a composition in stereolithography</title><date>2003-08-21</date><risdate>2003</risdate><abstract>The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US2003157435A1 |
source | esp@cenet |
subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
title | Use of a composition in stereolithography |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T20%3A58%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=BLACKWOOD%20KEITH%20M&rft.date=2003-08-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2003157435A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |