Fault classification in a plasma process chamber

A method of fault classification in a plasma process chamber powered by an RF source comprises initially running a plurality of different baseline plasma processes on the chamber. For each baseline process, the magnitudes of a plurality of Fourier components of delivered RF power are determined and...

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Bibliographische Detailangaben

Hauptverfasser:	SCANLAN JOHN, HOPKINS MICHAEL B
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING
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