Method for the deposition of silicon germanium layers

A vertical chemical vapor deposition (CVD) apparatus and methods for the deposition of compound films, such as silicon germanium films, are provided. In a preferred embodiment, the apparatus comprises a process chamber, wherein the process chamber is elongated in a first generally vertical direction...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZAGWIJN PETER MARC, OOSTERLAKEN THEODORUS GERARDUS MARIA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!