Manufacture of trench-gate semiconductor devices

The manufacture of a vertical power transistor trench-gate semiconductor device in which the source regions (13) are self-aligned to the trench-gate structures (20,17,11) including the steps of forming a mask (61) on a surface (10a) of a semiconductor body (10), using the mask (61) to form the trenc...

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Bibliographische Detailangaben
Hauptverfasser: HUETING RAYMOND J.E, ZANDT IN'T MICHAEL A.A, HIJZEN ERWIN A
Format: Patent
Sprache:eng
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