Process monitoring system for lithography lasers
A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area...
Gespeichert in:
| Hauptverfasser: | , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | TANTRA MULJADI GREEN ROGER L ROWAN CHRISTOPHER G CONWAY JOSEPH E MOEN JEFFREY W WATSON TOM A CARLESI JASON R PATEL PARTHIV S |
| description | A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area network. Information from the lasers is collected by the central control server unit and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2001020195A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2001020195A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2001020195A13</originalsourceid><addsrcrecordid>eNrjZDAIKMpPTi0uVsjNz8ssyS_KzEtXKK4sLknNVUjLL1LIySzJyE8vSizIqFTISSxOLSrmYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBgaGBkYGhpamjobGxKkCAF5mLNk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Process monitoring system for lithography lasers</title><source>esp@cenet</source><creator>TANTRA MULJADI ; GREEN ROGER L ; ROWAN CHRISTOPHER G ; CONWAY JOSEPH E ; MOEN JEFFREY W ; WATSON TOM A ; CARLESI JASON R ; PATEL PARTHIV S</creator><creatorcontrib>TANTRA MULJADI ; GREEN ROGER L ; ROWAN CHRISTOPHER G ; CONWAY JOSEPH E ; MOEN JEFFREY W ; WATSON TOM A ; CARLESI JASON R ; PATEL PARTHIV S</creatorcontrib><description>A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area network. Information from the lasers is collected by the central control server unit and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDEDFOR ELSEWHERE ; BASIC ELECTRIC ELEMENTS ; CHECKING-DEVICES ; CINEMATOGRAPHY ; CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; DEVICES USING STIMULATED EMISSION ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; GENERATING RANDOM NUMBERS ; HOLOGRAPHY ; MATERIALS THEREFOR ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; REGISTERING OR INDICATING THE WORKING OF MACHINES ; REGULATING ; SEMICONDUCTOR DEVICES ; TIME OR ATTENDANCE REGISTERS ; VOTING OR LOTTERY APPARATUS</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010906&DB=EPODOC&CC=US&NR=2001020195A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010906&DB=EPODOC&CC=US&NR=2001020195A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANTRA MULJADI</creatorcontrib><creatorcontrib>GREEN ROGER L</creatorcontrib><creatorcontrib>ROWAN CHRISTOPHER G</creatorcontrib><creatorcontrib>CONWAY JOSEPH E</creatorcontrib><creatorcontrib>MOEN JEFFREY W</creatorcontrib><creatorcontrib>WATSON TOM A</creatorcontrib><creatorcontrib>CARLESI JASON R</creatorcontrib><creatorcontrib>PATEL PARTHIV S</creatorcontrib><title>Process monitoring system for lithography lasers</title><description>A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area network. Information from the lasers is collected by the central control server unit and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDEDFOR ELSEWHERE</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHECKING-DEVICES</subject><subject>CINEMATOGRAPHY</subject><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>GENERATING RANDOM NUMBERS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>REGISTERING OR INDICATING THE WORKING OF MACHINES</subject><subject>REGULATING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TIME OR ATTENDANCE REGISTERS</subject><subject>VOTING OR LOTTERY APPARATUS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAIKMpPTi0uVsjNz8ssyS_KzEtXKK4sLknNVUjLL1LIySzJyE8vSizIqFTISSxOLSrmYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBgaGBkYGhpamjobGxKkCAF5mLNk</recordid><startdate>20010906</startdate><enddate>20010906</enddate><creator>TANTRA MULJADI</creator><creator>GREEN ROGER L</creator><creator>ROWAN CHRISTOPHER G</creator><creator>CONWAY JOSEPH E</creator><creator>MOEN JEFFREY W</creator><creator>WATSON TOM A</creator><creator>CARLESI JASON R</creator><creator>PATEL PARTHIV S</creator><scope>EVB</scope></search><sort><creationdate>20010906</creationdate><title>Process monitoring system for lithography lasers</title><author>TANTRA MULJADI ; GREEN ROGER L ; ROWAN CHRISTOPHER G ; CONWAY JOSEPH E ; MOEN JEFFREY W ; WATSON TOM A ; CARLESI JASON R ; PATEL PARTHIV S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2001020195A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2001</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDEDFOR ELSEWHERE</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHECKING-DEVICES</topic><topic>CINEMATOGRAPHY</topic><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>GENERATING RANDOM NUMBERS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>REGISTERING OR INDICATING THE WORKING OF MACHINES</topic><topic>REGULATING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TIME OR ATTENDANCE REGISTERS</topic><topic>VOTING OR LOTTERY APPARATUS</topic><toplevel>online_resources</toplevel><creatorcontrib>TANTRA MULJADI</creatorcontrib><creatorcontrib>GREEN ROGER L</creatorcontrib><creatorcontrib>ROWAN CHRISTOPHER G</creatorcontrib><creatorcontrib>CONWAY JOSEPH E</creatorcontrib><creatorcontrib>MOEN JEFFREY W</creatorcontrib><creatorcontrib>WATSON TOM A</creatorcontrib><creatorcontrib>CARLESI JASON R</creatorcontrib><creatorcontrib>PATEL PARTHIV S</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANTRA MULJADI</au><au>GREEN ROGER L</au><au>ROWAN CHRISTOPHER G</au><au>CONWAY JOSEPH E</au><au>MOEN JEFFREY W</au><au>WATSON TOM A</au><au>CARLESI JASON R</au><au>PATEL PARTHIV S</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Process monitoring system for lithography lasers</title><date>2001-09-06</date><risdate>2001</risdate><abstract>A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area network. Information from the lasers is collected by the central control server unit and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2001020195A1 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDEDFOR ELSEWHERE BASIC ELECTRIC ELEMENTS CHECKING-DEVICES CINEMATOGRAPHY CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS GENERATING RANDOM NUMBERS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGISTERING OR INDICATING THE WORKING OF MACHINES REGULATING SEMICONDUCTOR DEVICES TIME OR ATTENDANCE REGISTERS VOTING OR LOTTERY APPARATUS |
| title | Process monitoring system for lithography lasers |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-12T23%3A49%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TANTRA%20MULJADI&rft.date=2001-09-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2001020195A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |