Semiconductor device with extrinsic base region and method of fabrication therefor

A semiconductor device, such as a heterojunction bipolar transistor (HBT), may include an extrinsic base region that is connected to a collector region via semiconductor material formed in an opening in one or more dielectric layers interposed between the extrinsic base region and the collector regi...

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Hauptverfasser: Radic, Ljubo, Donkers, Johannes Josephus Theodorus Marinus, Grote, Bernhard
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creator Radic, Ljubo
Donkers, Johannes Josephus Theodorus Marinus
Grote, Bernhard
description A semiconductor device, such as a heterojunction bipolar transistor (HBT), may include an extrinsic base region that is connected to a collector region via semiconductor material formed in an opening in one or more dielectric layers interposed between the extrinsic base region and the collector region. The extrinsic base region may be formed from monocrystalline semiconductor material, such as silicon or silicon germanium, via selective epitaxial growth. An intrinsic base region may be formed adjacent to the extrinsic base region and may be interposed directly between the collector region and an intrinsic emitter region. A HBT with such an arrangement may have reduced base-collector capacitance and reduced base resistance compared to some conventional HBTs.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US12107143B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US12107143B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US12107143B23</originalsourceid><addsrcrecordid>eNqNyk0KwjAQhuFsXIh6h_EAgm0F94ri2uq6pMkXM2AzJRl_ji-CB3D1Lp53as4tBnaS_MOpZPJ4sgO9WCPhrZlTYUe9LaCMG0simzwN0CieJFCwfWZn9SsakREkz80k2HvB4teZWR4Pl_1phVE6lNE6JGh3bau6Wm-rTbOrm3-eD053OIA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Semiconductor device with extrinsic base region and method of fabrication therefor</title><source>esp@cenet</source><creator>Radic, Ljubo ; Donkers, Johannes Josephus Theodorus Marinus ; Grote, Bernhard</creator><creatorcontrib>Radic, Ljubo ; Donkers, Johannes Josephus Theodorus Marinus ; Grote, Bernhard</creatorcontrib><description>A semiconductor device, such as a heterojunction bipolar transistor (HBT), may include an extrinsic base region that is connected to a collector region via semiconductor material formed in an opening in one or more dielectric layers interposed between the extrinsic base region and the collector region. The extrinsic base region may be formed from monocrystalline semiconductor material, such as silicon or silicon germanium, via selective epitaxial growth. An intrinsic base region may be formed adjacent to the extrinsic base region and may be interposed directly between the collector region and an intrinsic emitter region. A HBT with such an arrangement may have reduced base-collector capacitance and reduced base resistance compared to some conventional HBTs.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20241001&amp;DB=EPODOC&amp;CC=US&amp;NR=12107143B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20241001&amp;DB=EPODOC&amp;CC=US&amp;NR=12107143B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Radic, Ljubo</creatorcontrib><creatorcontrib>Donkers, Johannes Josephus Theodorus Marinus</creatorcontrib><creatorcontrib>Grote, Bernhard</creatorcontrib><title>Semiconductor device with extrinsic base region and method of fabrication therefor</title><description>A semiconductor device, such as a heterojunction bipolar transistor (HBT), may include an extrinsic base region that is connected to a collector region via semiconductor material formed in an opening in one or more dielectric layers interposed between the extrinsic base region and the collector region. The extrinsic base region may be formed from monocrystalline semiconductor material, such as silicon or silicon germanium, via selective epitaxial growth. An intrinsic base region may be formed adjacent to the extrinsic base region and may be interposed directly between the collector region and an intrinsic emitter region. A HBT with such an arrangement may have reduced base-collector capacitance and reduced base resistance compared to some conventional HBTs.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyk0KwjAQhuFsXIh6h_EAgm0F94ri2uq6pMkXM2AzJRl_ji-CB3D1Lp53as4tBnaS_MOpZPJ4sgO9WCPhrZlTYUe9LaCMG0simzwN0CieJFCwfWZn9SsakREkz80k2HvB4teZWR4Pl_1phVE6lNE6JGh3bau6Wm-rTbOrm3-eD053OIA</recordid><startdate>20241001</startdate><enddate>20241001</enddate><creator>Radic, Ljubo</creator><creator>Donkers, Johannes Josephus Theodorus Marinus</creator><creator>Grote, Bernhard</creator><scope>EVB</scope></search><sort><creationdate>20241001</creationdate><title>Semiconductor device with extrinsic base region and method of fabrication therefor</title><author>Radic, Ljubo ; Donkers, Johannes Josephus Theodorus Marinus ; Grote, Bernhard</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US12107143B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Radic, Ljubo</creatorcontrib><creatorcontrib>Donkers, Johannes Josephus Theodorus Marinus</creatorcontrib><creatorcontrib>Grote, Bernhard</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Radic, Ljubo</au><au>Donkers, Johannes Josephus Theodorus Marinus</au><au>Grote, Bernhard</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semiconductor device with extrinsic base region and method of fabrication therefor</title><date>2024-10-01</date><risdate>2024</risdate><abstract>A semiconductor device, such as a heterojunction bipolar transistor (HBT), may include an extrinsic base region that is connected to a collector region via semiconductor material formed in an opening in one or more dielectric layers interposed between the extrinsic base region and the collector region. The extrinsic base region may be formed from monocrystalline semiconductor material, such as silicon or silicon germanium, via selective epitaxial growth. An intrinsic base region may be formed adjacent to the extrinsic base region and may be interposed directly between the collector region and an intrinsic emitter region. A HBT with such an arrangement may have reduced base-collector capacitance and reduced base resistance compared to some conventional HBTs.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Semiconductor device with extrinsic base region and method of fabrication therefor
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-17T03%3A50%3A19IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Radic,%20Ljubo&rft.date=2024-10-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS12107143B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true