Methods of manufacturing semiconductor devices

A method of manufacturing a semiconductor device includes forming an interlayer insulating layer on a substrate, forming a first mask layer on the interlayer insulating layer, forming a second mask layer and a first spacer on the first mask layer, forming a photoresist pattern on the second mask lay...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kim, Duck-Nam, Son, Sae Il, You, Kwang-Ho, Bai, Keunhee, Lee, Hyunki, Jang, Cheolin
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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