Carboxylate, quencher, resist composition and method for producing resist pattern

A carboxylate represented by formula (I), a quencher and a resist composition including the same:wherein R1, R2 and R3 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, -CH2- included in the hydrocarbon group may be replaced by -O-, -CO-, -S-...

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Bibliographische Detailangaben
Hauptverfasser:	Komuro, Katsuhiro, Ichikawa, Koji
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A carboxylate represented by formula (I), a quencher and a resist composition including the same:wherein R1, R2 and R3 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, -CH2- included in the hydrocarbon group may be replaced by -O-, -CO-, -S- or -SO2-, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and X1 represents a single bond, -CH2-, -O-, -S-, -CO-, -SO- or -SO2-.