Defect inspection apparatus, method and program

Defect inspection apparatus, method and program

According to one embodiment, a defect inspection apparatus includes a storage and a processor. The storage stores dictionary in which a first design image generated by software is associated with a first real image corresponding to the first design image. The processor acquires a second design image...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Sakata, Yukinobu, Hirai, Ryusuke, Tanizawa, Akiyuki, Sugiura, Kyoka
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
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Beschreibung
Zusammenfassung:According to one embodiment, a defect inspection apparatus includes a storage and a processor. The storage stores dictionary in which a first design image generated by software is associated with a first real image corresponding to the first design image. The processor acquires a second design image generated by the software. The processor searches for a similar first design image similar to the second design image. The processor generates a reference image that is a pseudo real image of a second inspection object, based on the second design data and free of defect, by using the first real image associated with the similar first design image. The first design image includes information of an image area wider than the first real image.