Particle-dispersed polyimide precursor solution, method for producing porous polyimide film, and porous polyimide film
A particle-dispersed polyimide precursor solution contains a polyimide precursor having a unit represented by the following formula (I), particles, and a solvent, in which the particle-dispersed polyimide precursor solution satisfies both the following conditions (1) and (2),(in the formula (I), A r...
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| creator | Sasaki, Tomoya Yoshimura, Kosaku Nakada, Kosuke Hirose, Hidekazu Okubo, Tomoyo Sugahara, Hajime Kashima, Yasunobu |
| description | A particle-dispersed polyimide precursor solution contains a polyimide precursor having a unit represented by the following formula (I), particles, and a solvent, in which the particle-dispersed polyimide precursor solution satisfies both the following conditions (1) and (2),(in the formula (I), A represents a tetravalent organic group, and B represents a divalent organic group represented by any of the following formulas (B1) to (B4)),(in the formulas (B1) to (B4), Ar1, Ar10, and Ar11 each independently represent a trivalent aromatic group which may have a substituent, Ar2, Ar4, Ar5, Ar7 and Ar8 each independently represent a divalent aromatic group which may have a substituent, Ar3 and Ar6 each independently represent a tetravalent aromatic group which may have a substituent or a group represented by the following formula (II), Ar9 represents a divalent aromatic group which may have a substituent or a group represented by the following formula (III), X1 to X7 each independently represent NRa, O, or S, Ra represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group), and(in the formulas (II) and (III), Ar12 and Ar13 each independently represent a trivalent aromatic group which may have a substituent, Ar14 and Ar15 each independently represent a divalent aromatic group which may have a substituent, Y and Z each independently represent O, S, S(═O)2, or CRbRc, Rb and Rc each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group),Condition (1): a total content of the groups represented by the formulas (B1) to (B4) is 1% by mass or more and 40% by mass or less with respect to a total amount of the polyimide precursor, andCondition (2): a content of the particles is 5% by mass or more and 90% by mass or less with respect to a total content of the polyimide precursor and the particles. |
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Nakada, Kosuke ; Hirose, Hidekazu ; Okubo, Tomoyo ; Sugahara, Hajime ; Kashima, Yasunobu</creatorcontrib><description>A particle-dispersed polyimide precursor solution contains a polyimide precursor having a unit represented by the following formula (I), particles, and a solvent, in which the particle-dispersed polyimide precursor solution satisfies both the following conditions (1) and (2),(in the formula (I), A represents a tetravalent organic group, and B represents a divalent organic group represented by any of the following formulas (B1) to (B4)),(in the formulas (B1) to (B4), Ar1, Ar10, and Ar11 each independently represent a trivalent aromatic group which may have a substituent, Ar2, Ar4, Ar5, Ar7 and Ar8 each independently represent a divalent aromatic group which may have a substituent, Ar3 and Ar6 each independently represent a tetravalent aromatic group which may have a substituent or a group represented by the following formula (II), Ar9 represents a divalent aromatic group which may have a substituent or a group represented by the following formula (III), X1 to X7 each independently represent NRa, O, or S, Ra represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group), and(in the formulas (II) and (III), Ar12 and Ar13 each independently represent a trivalent aromatic group which may have a substituent, Ar14 and Ar15 each independently represent a divalent aromatic group which may have a substituent, Y and Z each independently represent O, S, S(═O)2, or CRbRc, Rb and Rc each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group),Condition (1): a total content of the groups represented by the formulas (B1) to (B4) is 1% by mass or more and 40% by mass or less with respect to a total amount of the polyimide precursor, andCondition (2): a content of the particles is 5% by mass or more and 90% by mass or less with respect to a total content of the polyimide precursor and the particles.</description><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240625&DB=EPODOC&CC=US&NR=12018128B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240625&DB=EPODOC&CC=US&NR=12018128B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Sasaki, Tomoya</creatorcontrib><creatorcontrib>Yoshimura, Kosaku</creatorcontrib><creatorcontrib>Nakada, Kosuke</creatorcontrib><creatorcontrib>Hirose, Hidekazu</creatorcontrib><creatorcontrib>Okubo, Tomoyo</creatorcontrib><creatorcontrib>Sugahara, Hajime</creatorcontrib><creatorcontrib>Kashima, Yasunobu</creatorcontrib><title>Particle-dispersed polyimide precursor solution, method for producing porous polyimide film, and porous polyimide film</title><description>A particle-dispersed polyimide precursor solution contains a polyimide precursor having a unit represented by the following formula (I), particles, and a solvent, in which the particle-dispersed polyimide precursor solution satisfies both the following conditions (1) and (2),(in the formula (I), A represents a tetravalent organic group, and B represents a divalent organic group represented by any of the following formulas (B1) to (B4)),(in the formulas (B1) to (B4), Ar1, Ar10, and Ar11 each independently represent a trivalent aromatic group which may have a substituent, Ar2, Ar4, Ar5, Ar7 and Ar8 each independently represent a divalent aromatic group which may have a substituent, Ar3 and Ar6 each independently represent a tetravalent aromatic group which may have a substituent or a group represented by the following formula (II), Ar9 represents a divalent aromatic group which may have a substituent or a group represented by the following formula (III), X1 to X7 each independently represent NRa, O, or S, Ra represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group), and(in the formulas (II) and (III), Ar12 and Ar13 each independently represent a trivalent aromatic group which may have a substituent, Ar14 and Ar15 each independently represent a divalent aromatic group which may have a substituent, Y and Z each independently represent O, S, S(═O)2, or CRbRc, Rb and Rc each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group),Condition (1): a total content of the groups represented by the formulas (B1) to (B4) is 1% by mass or more and 40% by mass or less with respect to a total amount of the polyimide precursor, andCondition (2): a content of the particles is 5% by mass or more and 90% by mass or less with respect to a total content of the polyimide precursor and the particles.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7EKAjEQBa-xEPUfYn8H5myuVhRLQa2PkGx0IcmG3UTw773CwsLCauDNm3nzPBsuaAN0DiUDCziVKbwwogOVGWxlIVZCoRak1KoI5UFO-WnMTK5aTPcpYaryVXoMsVUmud9q2cy8CQKrDxfN-ni47k8dZBpBsrGQoIy3i-43etD9sOu3_3ze3DtGxw</recordid><startdate>20240625</startdate><enddate>20240625</enddate><creator>Sasaki, Tomoya</creator><creator>Yoshimura, Kosaku</creator><creator>Nakada, Kosuke</creator><creator>Hirose, Hidekazu</creator><creator>Okubo, Tomoyo</creator><creator>Sugahara, Hajime</creator><creator>Kashima, Yasunobu</creator><scope>EVB</scope></search><sort><creationdate>20240625</creationdate><title>Particle-dispersed polyimide precursor solution, method for producing porous polyimide film, and porous polyimide film</title><author>Sasaki, Tomoya ; Yoshimura, Kosaku ; Nakada, Kosuke ; Hirose, Hidekazu ; Okubo, Tomoyo ; Sugahara, Hajime ; Kashima, Yasunobu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US12018128B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>Sasaki, Tomoya</creatorcontrib><creatorcontrib>Yoshimura, Kosaku</creatorcontrib><creatorcontrib>Nakada, Kosuke</creatorcontrib><creatorcontrib>Hirose, Hidekazu</creatorcontrib><creatorcontrib>Okubo, Tomoyo</creatorcontrib><creatorcontrib>Sugahara, Hajime</creatorcontrib><creatorcontrib>Kashima, Yasunobu</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Sasaki, Tomoya</au><au>Yoshimura, Kosaku</au><au>Nakada, Kosuke</au><au>Hirose, Hidekazu</au><au>Okubo, Tomoyo</au><au>Sugahara, Hajime</au><au>Kashima, Yasunobu</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Particle-dispersed polyimide precursor solution, method for producing porous polyimide film, and porous polyimide film</title><date>2024-06-25</date><risdate>2024</risdate><abstract>A particle-dispersed polyimide precursor solution contains a polyimide precursor having a unit represented by the following formula (I), particles, and a solvent, in which the particle-dispersed polyimide precursor solution satisfies both the following conditions (1) and (2),(in the formula (I), A represents a tetravalent organic group, and B represents a divalent organic group represented by any of the following formulas (B1) to (B4)),(in the formulas (B1) to (B4), Ar1, Ar10, and Ar11 each independently represent a trivalent aromatic group which may have a substituent, Ar2, Ar4, Ar5, Ar7 and Ar8 each independently represent a divalent aromatic group which may have a substituent, Ar3 and Ar6 each independently represent a tetravalent aromatic group which may have a substituent or a group represented by the following formula (II), Ar9 represents a divalent aromatic group which may have a substituent or a group represented by the following formula (III), X1 to X7 each independently represent NRa, O, or S, Ra represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group), and(in the formulas (II) and (III), Ar12 and Ar13 each independently represent a trivalent aromatic group which may have a substituent, Ar14 and Ar15 each independently represent a divalent aromatic group which may have a substituent, Y and Z each independently represent O, S, S(═O)2, or CRbRc, Rb and Rc each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group),Condition (1): a total content of the groups represented by the formulas (B1) to (B4) is 1% by mass or more and 40% by mass or less with respect to a total amount of the polyimide precursor, andCondition (2): a content of the particles is 5% by mass or more and 90% by mass or less with respect to a total content of the polyimide precursor and the particles.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
| title | Particle-dispersed polyimide precursor solution, method for producing porous polyimide film, and porous polyimide film |
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