Method of manufacturing a semiconductor apparatus having stacked devices

A method for forming a semiconductor apparatus includes forming a plurality of repetitive initial structures over a substrate of the semiconductor apparatus. An initial structure in the plurality of repetitive initial structures is formed by forming a first stack of transistors along a Z direction s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Liebmann, Lars, Smith, Jeffrey, deVilliers, Anton
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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