Semiconductor equipment regulation method and semiconductor device fabrication method

The present application relates to a semiconductor equipment regulation method, including: providing a simulated wafer; placing the simulated wafer in an etching chamber, and conditioning a temperature in the chamber by using a temperature control device while the simulated wafer is etched by using...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Bao, Xifei, Shen, Runsheng
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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