Chemical supply apparatus, method for removing particles from chemical, nozzle unit, and substrate treating apparatus

A chemical supply apparatus includes an evaporation unit disposed downstream of a chemical supply source to vaporize supplied chemical thereto, a filter unit disposed downstream of the evaporation unit, wherein the filter unit filters impurities in the vaporized chemical while the vaporized chemical...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Hong, Yong Hoon, Lee, Ji Young, Kim, Heehwan, Kim, Young Su, Yoon, Dohyeon
Format: Patent
Sprache:eng
Schlagworte:
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