Protective sealant for chalcogenide material and methods for forming the same
Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | Grubbs, Robert K Good, Farrell M Lugani, Gurpreet S |
description | Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11980108B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11980108B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11980108B23</originalsourceid><addsrcrecordid>eNqNiz0KAjEUBtNYiHqH5wGEjTZru6LYCIJaL4_k200gP0vy8Pwu4gEshmlmlup2L1lgxL9BFRw4CQ25kHEcTB6RvAVFFhTPgThZihCXbf1WM9GnkcTNN0es1WLgULH5eaW2l_PzdN1hyj3qxAYJ0r8eWh_bRjdttz_803wA8QY2YA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Protective sealant for chalcogenide material and methods for forming the same</title><source>esp@cenet</source><creator>Grubbs, Robert K ; Good, Farrell M ; Lugani, Gurpreet S</creator><creatorcontrib>Grubbs, Robert K ; Good, Farrell M ; Lugani, Gurpreet S</creatorcontrib><description>Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched.</description><language>eng</language><subject>ELECTRICITY</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240507&DB=EPODOC&CC=US&NR=11980108B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240507&DB=EPODOC&CC=US&NR=11980108B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Grubbs, Robert K</creatorcontrib><creatorcontrib>Good, Farrell M</creatorcontrib><creatorcontrib>Lugani, Gurpreet S</creatorcontrib><title>Protective sealant for chalcogenide material and methods for forming the same</title><description>Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched.</description><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNiz0KAjEUBtNYiHqH5wGEjTZru6LYCIJaL4_k200gP0vy8Pwu4gEshmlmlup2L1lgxL9BFRw4CQ25kHEcTB6RvAVFFhTPgThZihCXbf1WM9GnkcTNN0es1WLgULH5eaW2l_PzdN1hyj3qxAYJ0r8eWh_bRjdttz_803wA8QY2YA</recordid><startdate>20240507</startdate><enddate>20240507</enddate><creator>Grubbs, Robert K</creator><creator>Good, Farrell M</creator><creator>Lugani, Gurpreet S</creator><scope>EVB</scope></search><sort><creationdate>20240507</creationdate><title>Protective sealant for chalcogenide material and methods for forming the same</title><author>Grubbs, Robert K ; Good, Farrell M ; Lugani, Gurpreet S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11980108B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>Grubbs, Robert K</creatorcontrib><creatorcontrib>Good, Farrell M</creatorcontrib><creatorcontrib>Lugani, Gurpreet S</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Grubbs, Robert K</au><au>Good, Farrell M</au><au>Lugani, Gurpreet S</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Protective sealant for chalcogenide material and methods for forming the same</title><date>2024-05-07</date><risdate>2024</risdate><abstract>Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US11980108B2 |
source | esp@cenet |
subjects | ELECTRICITY |
title | Protective sealant for chalcogenide material and methods for forming the same |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T06%3A03%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Grubbs,%20Robert%20K&rft.date=2024-05-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11980108B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |