Low-temperature/BEOL-compatible highly scalable graphene synthesis tool

In one aspect, a highly scalable diffusion-couple apparatus includes a transfer chamber configured to load a wafer into a process chamber. The process chamber is configured to receive the wafer substrate from the transfer chamber. The process chamber comprises a chamber for growth of a diffusion mat...

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Bibliographische Detailangaben
Hauptverfasser: Banerjee, Kaustav, Sundar, Satish, Rupesinghe, Nalin, Iyengar, Ravi
Format: Patent
Sprache:eng
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