Metal-insulator-metal capacitor with top contact

Disclosed are examples of a device and method of fabricating a device including a first top contact, a second top contact, adjacent the first top contact, a first mesa disposed below the first top contact and a second mesa disposed below the second top contact. A first plate of a metal-insulator-met...

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Hauptverfasser: Zhu, John Jianhong, Nallapati, Giridhar, Ge, Lixin
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creator Zhu, John Jianhong
Nallapati, Giridhar
Ge, Lixin
description Disclosed are examples of a device and method of fabricating a device including a first top contact, a second top contact, adjacent the first top contact, a first mesa disposed below the first top contact and a second mesa disposed below the second top contact. A first plate of a metal-insulator-metal (MIM) capacitor is disposed below the first top contact and electrically coupled to the first top contact. A first insulator of the MIM capacitor is disposed on the first plate. A second plate of the MIM capacitor is disposed on the first insulator and electrically coupled to the second top contact. A second insulator of the MIM capacitor is disposed on the second plate. A third plate of the MIM capacitor is disposed on the second insulator and electrically coupled to the first top contact.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11973020B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11973020B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11973020B23</originalsourceid><addsrcrecordid>eNrjZDDwTS1JzNHNzCsuzUksyS_SzQXxFZITCxKTM4F8hfLMkgyFkvwCheT8vJLE5BIeBta0xJziVF4ozc2g6OYa4uyhm1qQH59aDNSWmpdaEh8abGhoaW5sYGTgZGRMjBoAgjgrqw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Metal-insulator-metal capacitor with top contact</title><source>esp@cenet</source><creator>Zhu, John Jianhong ; Nallapati, Giridhar ; Ge, Lixin</creator><creatorcontrib>Zhu, John Jianhong ; Nallapati, Giridhar ; Ge, Lixin</creatorcontrib><description>Disclosed are examples of a device and method of fabricating a device including a first top contact, a second top contact, adjacent the first top contact, a first mesa disposed below the first top contact and a second mesa disposed below the second top contact. A first plate of a metal-insulator-metal (MIM) capacitor is disposed below the first top contact and electrically coupled to the first top contact. A first insulator of the MIM capacitor is disposed on the first plate. A second plate of the MIM capacitor is disposed on the first insulator and electrically coupled to the second top contact. A second insulator of the MIM capacitor is disposed on the second plate. A third plate of the MIM capacitor is disposed on the second insulator and electrically coupled to the first top contact.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240430&amp;DB=EPODOC&amp;CC=US&amp;NR=11973020B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240430&amp;DB=EPODOC&amp;CC=US&amp;NR=11973020B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Zhu, John Jianhong</creatorcontrib><creatorcontrib>Nallapati, Giridhar</creatorcontrib><creatorcontrib>Ge, Lixin</creatorcontrib><title>Metal-insulator-metal capacitor with top contact</title><description>Disclosed are examples of a device and method of fabricating a device including a first top contact, a second top contact, adjacent the first top contact, a first mesa disposed below the first top contact and a second mesa disposed below the second top contact. A first plate of a metal-insulator-metal (MIM) capacitor is disposed below the first top contact and electrically coupled to the first top contact. A first insulator of the MIM capacitor is disposed on the first plate. A second plate of the MIM capacitor is disposed on the first insulator and electrically coupled to the second top contact. A second insulator of the MIM capacitor is disposed on the second plate. A third plate of the MIM capacitor is disposed on the second insulator and electrically coupled to the first top contact.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDwTS1JzNHNzCsuzUksyS_SzQXxFZITCxKTM4F8hfLMkgyFkvwCheT8vJLE5BIeBta0xJziVF4ozc2g6OYa4uyhm1qQH59aDNSWmpdaEh8abGhoaW5sYGTgZGRMjBoAgjgrqw</recordid><startdate>20240430</startdate><enddate>20240430</enddate><creator>Zhu, John Jianhong</creator><creator>Nallapati, Giridhar</creator><creator>Ge, Lixin</creator><scope>EVB</scope></search><sort><creationdate>20240430</creationdate><title>Metal-insulator-metal capacitor with top contact</title><author>Zhu, John Jianhong ; Nallapati, Giridhar ; Ge, Lixin</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11973020B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Zhu, John Jianhong</creatorcontrib><creatorcontrib>Nallapati, Giridhar</creatorcontrib><creatorcontrib>Ge, Lixin</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zhu, John Jianhong</au><au>Nallapati, Giridhar</au><au>Ge, Lixin</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Metal-insulator-metal capacitor with top contact</title><date>2024-04-30</date><risdate>2024</risdate><abstract>Disclosed are examples of a device and method of fabricating a device including a first top contact, a second top contact, adjacent the first top contact, a first mesa disposed below the first top contact and a second mesa disposed below the second top contact. A first plate of a metal-insulator-metal (MIM) capacitor is disposed below the first top contact and electrically coupled to the first top contact. A first insulator of the MIM capacitor is disposed on the first plate. A second plate of the MIM capacitor is disposed on the first insulator and electrically coupled to the second top contact. A second insulator of the MIM capacitor is disposed on the second plate. A third plate of the MIM capacitor is disposed on the second insulator and electrically coupled to the first top contact.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Metal-insulator-metal capacitor with top contact
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T22%3A14%3A02IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Zhu,%20John%20Jianhong&rft.date=2024-04-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11973020B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true