Deposition mask, method of manufacturing the same, and method of manufacturing display panel

A deposition mask for manufacturing a display panel includes a metallic base having a thickness of about 50 micrometers to about 200 micrometers and a plurality of openings defined therein, wherein at least some of the openings include a first opening having a first width and a second opening having...

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Hauptverfasser: Hong, Jaemin, Jin, Seungmin, Nam, Kanghyun, Park, Sangha, Hwang, Kyu Hwan, Jeong, Da-Hee, Kim, Jeongkuk, Lee, Areum, Kim, Hwi, Jo, Eunbee
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creator Hong, Jaemin
Jin, Seungmin
Nam, Kanghyun
Park, Sangha
Hwang, Kyu Hwan
Jeong, Da-Hee
Kim, Jeongkuk
Lee, Areum
Kim, Hwi
Jo, Eunbee
description A deposition mask for manufacturing a display panel includes a metallic base having a thickness of about 50 micrometers to about 200 micrometers and a plurality of openings defined therein, wherein at least some of the openings include a first opening having a first width and a second opening having a second width smaller than the first width respectively defined along a thickness direction of the metallic base, and wherein the metallic base includes a first part in which the first opening is defined, and a second part in which the second opening is defined, the second part having a width that increases in a direction downward from a top surface of the metallic base along the thickness direction of the metallic base.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11950489B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11950489B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11950489B23</originalsourceid><addsrcrecordid>eNrjZIhxSS3IL84syczPU8hNLM7WUchNLcnIT1HITwPy80rTEpNLSosy89IVSjJSFYoTc1N1FBLzUnCqSsksLshJrFQoSMxLzeFhYE1LzClO5YXS3AyKbq4hzh66QDvjU4sLEpNT81JL4kODDQ0tTQ1MLCydjIyJUQMAlQI71w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Deposition mask, method of manufacturing the same, and method of manufacturing display panel</title><source>esp@cenet</source><creator>Hong, Jaemin ; Jin, Seungmin ; Nam, Kanghyun ; Park, Sangha ; Hwang, Kyu Hwan ; Jeong, Da-Hee ; Kim, Jeongkuk ; Lee, Areum ; Kim, Hwi ; Jo, Eunbee</creator><creatorcontrib>Hong, Jaemin ; Jin, Seungmin ; Nam, Kanghyun ; Park, Sangha ; Hwang, Kyu Hwan ; Jeong, Da-Hee ; Kim, Jeongkuk ; Lee, Areum ; Kim, Hwi ; Jo, Eunbee</creatorcontrib><description>A deposition mask for manufacturing a display panel includes a metallic base having a thickness of about 50 micrometers to about 200 micrometers and a plurality of openings defined therein, wherein at least some of the openings include a first opening having a first width and a second opening having a second width smaller than the first width respectively defined along a thickness direction of the metallic base, and wherein the metallic base includes a first part in which the first opening is defined, and a second part in which the second opening is defined, the second part having a width that increases in a direction downward from a top surface of the metallic base along the thickness direction of the metallic base.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240402&amp;DB=EPODOC&amp;CC=US&amp;NR=11950489B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240402&amp;DB=EPODOC&amp;CC=US&amp;NR=11950489B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Hong, Jaemin</creatorcontrib><creatorcontrib>Jin, Seungmin</creatorcontrib><creatorcontrib>Nam, Kanghyun</creatorcontrib><creatorcontrib>Park, Sangha</creatorcontrib><creatorcontrib>Hwang, Kyu Hwan</creatorcontrib><creatorcontrib>Jeong, Da-Hee</creatorcontrib><creatorcontrib>Kim, Jeongkuk</creatorcontrib><creatorcontrib>Lee, Areum</creatorcontrib><creatorcontrib>Kim, Hwi</creatorcontrib><creatorcontrib>Jo, Eunbee</creatorcontrib><title>Deposition mask, method of manufacturing the same, and method of manufacturing display panel</title><description>A deposition mask for manufacturing a display panel includes a metallic base having a thickness of about 50 micrometers to about 200 micrometers and a plurality of openings defined therein, wherein at least some of the openings include a first opening having a first width and a second opening having a second width smaller than the first width respectively defined along a thickness direction of the metallic base, and wherein the metallic base includes a first part in which the first opening is defined, and a second part in which the second opening is defined, the second part having a width that increases in a direction downward from a top surface of the metallic base along the thickness direction of the metallic base.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIhxSS3IL84syczPU8hNLM7WUchNLcnIT1HITwPy80rTEpNLSosy89IVSjJSFYoTc1N1FBLzUnCqSsksLshJrFQoSMxLzeFhYE1LzClO5YXS3AyKbq4hzh66QDvjU4sLEpNT81JL4kODDQ0tTQ1MLCydjIyJUQMAlQI71w</recordid><startdate>20240402</startdate><enddate>20240402</enddate><creator>Hong, Jaemin</creator><creator>Jin, Seungmin</creator><creator>Nam, Kanghyun</creator><creator>Park, Sangha</creator><creator>Hwang, Kyu Hwan</creator><creator>Jeong, Da-Hee</creator><creator>Kim, Jeongkuk</creator><creator>Lee, Areum</creator><creator>Kim, Hwi</creator><creator>Jo, Eunbee</creator><scope>EVB</scope></search><sort><creationdate>20240402</creationdate><title>Deposition mask, method of manufacturing the same, and method of manufacturing display panel</title><author>Hong, Jaemin ; Jin, Seungmin ; Nam, Kanghyun ; Park, Sangha ; Hwang, Kyu Hwan ; Jeong, Da-Hee ; Kim, Jeongkuk ; Lee, Areum ; Kim, Hwi ; Jo, Eunbee</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11950489B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>Hong, Jaemin</creatorcontrib><creatorcontrib>Jin, Seungmin</creatorcontrib><creatorcontrib>Nam, Kanghyun</creatorcontrib><creatorcontrib>Park, Sangha</creatorcontrib><creatorcontrib>Hwang, Kyu Hwan</creatorcontrib><creatorcontrib>Jeong, Da-Hee</creatorcontrib><creatorcontrib>Kim, Jeongkuk</creatorcontrib><creatorcontrib>Lee, Areum</creatorcontrib><creatorcontrib>Kim, Hwi</creatorcontrib><creatorcontrib>Jo, Eunbee</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Hong, Jaemin</au><au>Jin, Seungmin</au><au>Nam, Kanghyun</au><au>Park, Sangha</au><au>Hwang, Kyu Hwan</au><au>Jeong, Da-Hee</au><au>Kim, Jeongkuk</au><au>Lee, Areum</au><au>Kim, Hwi</au><au>Jo, Eunbee</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Deposition mask, method of manufacturing the same, and method of manufacturing display panel</title><date>2024-04-02</date><risdate>2024</risdate><abstract>A deposition mask for manufacturing a display panel includes a metallic base having a thickness of about 50 micrometers to about 200 micrometers and a plurality of openings defined therein, wherein at least some of the openings include a first opening having a first width and a second opening having a second width smaller than the first width respectively defined along a thickness direction of the metallic base, and wherein the metallic base includes a first part in which the first opening is defined, and a second part in which the second opening is defined, the second part having a width that increases in a direction downward from a top surface of the metallic base along the thickness direction of the metallic base.</abstract><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Deposition mask, method of manufacturing the same, and method of manufacturing display panel
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T19%3A13%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Hong,%20Jaemin&rft.date=2024-04-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11950489B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true