Methods for calibrating an optical emission spectrometer
One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned wi...
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| creator | Guarini, Theresa Kramer Bevan, Malcolm J Lo, Kin Pong Hawrylchak, Lara Liu, Wei Hwang, Bernard L |
| description | One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned within the light fixture such that it provides an optical path that projects directly at a window through which the OES looks into the process chamber for its reading. When the light source is on, the OES measures the optical intensity of radiation from the light source. To calibrate the OES, the optical intensity of the light source is compared at two separate times when the light source is on. If the optical intensity of radiation at the first time is different than the optical intensity of radiation at the second time, the OES is modified. |
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In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned within the light fixture such that it provides an optical path that projects directly at a window through which the OES looks into the process chamber for its reading. When the light source is on, the OES measures the optical intensity of radiation from the light source. To calibrate the OES, the optical intensity of the light source is compared at two separate times when the light source is on. 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In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned within the light fixture such that it provides an optical path that projects directly at a window through which the OES looks into the process chamber for its reading. When the light source is on, the OES measures the optical intensity of radiation from the light source. To calibrate the OES, the optical intensity of the light source is compared at two separate times when the light source is on. If the optical intensity of radiation at the first time is different than the optical intensity of radiation at the second time, the OES is modified.</description><subject>COLORIMETRY</subject><subject>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>RADIATION PYROMETRY</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDwTS3JyE8pVkjLL1JITszJTCpKLMnMS1dIzFPILyjJBAoppOZmFhdn5ucpFBekJpcU5eemlqQW8TCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSS-NBgQ0NLI3MTCyMnI2Ni1AAAN6gu8Q</recordid><startdate>20240312</startdate><enddate>20240312</enddate><creator>Guarini, Theresa Kramer</creator><creator>Bevan, Malcolm J</creator><creator>Lo, Kin Pong</creator><creator>Hawrylchak, Lara</creator><creator>Liu, Wei</creator><creator>Hwang, Bernard L</creator><scope>EVB</scope></search><sort><creationdate>20240312</creationdate><title>Methods for calibrating an optical emission spectrometer</title><author>Guarini, Theresa Kramer ; Bevan, Malcolm J ; Lo, Kin Pong ; Hawrylchak, Lara ; Liu, Wei ; Hwang, Bernard L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11927482B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>COLORIMETRY</topic><topic>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>RADIATION PYROMETRY</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Guarini, Theresa Kramer</creatorcontrib><creatorcontrib>Bevan, Malcolm J</creatorcontrib><creatorcontrib>Lo, Kin Pong</creatorcontrib><creatorcontrib>Hawrylchak, Lara</creatorcontrib><creatorcontrib>Liu, Wei</creatorcontrib><creatorcontrib>Hwang, Bernard L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Guarini, Theresa Kramer</au><au>Bevan, Malcolm J</au><au>Lo, Kin Pong</au><au>Hawrylchak, Lara</au><au>Liu, Wei</au><au>Hwang, Bernard L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods for calibrating an optical emission spectrometer</title><date>2024-03-12</date><risdate>2024</risdate><abstract>One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned within the light fixture such that it provides an optical path that projects directly at a window through which the OES looks into the process chamber for its reading. When the light source is on, the OES measures the optical intensity of radiation from the light source. To calibrate the OES, the optical intensity of the light source is compared at two separate times when the light source is on. If the optical intensity of radiation at the first time is different than the optical intensity of radiation at the second time, the OES is modified.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | COLORIMETRY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING PHYSICS RADIATION PYROMETRY TESTING |
| title | Methods for calibrating an optical emission spectrometer |
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