Method for manufacturing projection screen and projection screen
A method for manufacturing a projection screen and a projection screen are provided. The method includes: preparing a substrate; under a first preparation condition, forming a reflective layer by vacuum plating above the substrate; and under a second preparation condition, forming a diffusion layer...
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creator | Zhang, Hongxiu Sun, Wei Cui, Kejian Li, Yi |
description | A method for manufacturing a projection screen and a projection screen are provided. The method includes: preparing a substrate; under a first preparation condition, forming a reflective layer by vacuum plating above the substrate; and under a second preparation condition, forming a diffusion layer by the vacuum plating on the reflective layer. The second preparation condition is different from the first preparation condition, and a sputtering power in the second preparation condition is higher than a sputtering power in the first preparation condition. |
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The method includes: preparing a substrate; under a first preparation condition, forming a reflective layer by vacuum plating above the substrate; and under a second preparation condition, forming a diffusion layer by the vacuum plating on the reflective layer. The second preparation condition is different from the first preparation condition, and a sputtering power in the second preparation condition is higher than a sputtering power in the first preparation condition.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CINEMATOGRAPHY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROGRAPHY ; HOLOGRAPHY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PHOTOGRAPHY ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240305&DB=EPODOC&CC=US&NR=11921412B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240305&DB=EPODOC&CC=US&NR=11921412B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Zhang, Hongxiu</creatorcontrib><creatorcontrib>Sun, Wei</creatorcontrib><creatorcontrib>Cui, Kejian</creatorcontrib><creatorcontrib>Li, Yi</creatorcontrib><title>Method for manufacturing projection screen and projection screen</title><description>A method for manufacturing a projection screen and a projection screen are provided. The method includes: preparing a substrate; under a first preparation condition, forming a reflective layer by vacuum plating above the substrate; and under a second preparation condition, forming a diffusion layer by the vacuum plating on the reflective layer. The second preparation condition is different from the first preparation condition, and a sputtering power in the second preparation condition is higher than a sputtering power in the first preparation condition.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PHOTOGRAPHY</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDwTS3JyE9RSMsvUshNzCtNS0wuKS3KzEtXKCjKz0pNLsnMz1MoTi5KTc1TSMxLwRTlYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxocGGhpZGhiaGRk5GxsSoAQAMfzHu</recordid><startdate>20240305</startdate><enddate>20240305</enddate><creator>Zhang, Hongxiu</creator><creator>Sun, Wei</creator><creator>Cui, Kejian</creator><creator>Li, Yi</creator><scope>EVB</scope></search><sort><creationdate>20240305</creationdate><title>Method for manufacturing projection screen and projection screen</title><author>Zhang, Hongxiu ; Sun, Wei ; Cui, Kejian ; Li, Yi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11921412B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PHOTOGRAPHY</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>Zhang, Hongxiu</creatorcontrib><creatorcontrib>Sun, Wei</creatorcontrib><creatorcontrib>Cui, Kejian</creatorcontrib><creatorcontrib>Li, Yi</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zhang, Hongxiu</au><au>Sun, Wei</au><au>Cui, Kejian</au><au>Li, Yi</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for manufacturing projection screen and projection screen</title><date>2024-03-05</date><risdate>2024</risdate><abstract>A method for manufacturing a projection screen and a projection screen are provided. The method includes: preparing a substrate; under a first preparation condition, forming a reflective layer by vacuum plating above the substrate; and under a second preparation condition, forming a diffusion layer by the vacuum plating on the reflective layer. The second preparation condition is different from the first preparation condition, and a sputtering power in the second preparation condition is higher than a sputtering power in the first preparation condition.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHOTOGRAPHY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Method for manufacturing projection screen and projection screen |
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