Field plate structure to enhance transistor breakdown voltage

Various embodiments of the present disclosure are directed towards an integrated chip including a field plate. A gate structure overlies a substrate between a source region and a drain region. A drift region is disposed laterally between the gate structure and the drain region. A first dielectric la...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Ho, Chia-Cheng, Jong, Yu-Chang, Lei, Ming-Ta
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Various embodiments of the present disclosure are directed towards an integrated chip including a field plate. A gate structure overlies a substrate between a source region and a drain region. A drift region is disposed laterally between the gate structure and the drain region. A first dielectric layer overlies the substrate. A field plate is disposed within the first dielectric layer between the gate structure and the drain region. A conductive wire overlies the first dielectric layer and contacts the field plate. At least a portion of the conductive wire directly overlies a first sidewall of the drift region.