Electron beam application apparatus

Provided is a projection electron beam application apparatus suitable for use in semiconductor manufacturing lines. An electron optical system of the electron beam application apparatus includes a mirror aberration corrector 106 disposed perpendicular to an optical axis 109, a plurality of magnetic...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Enyama, Momoyo, Morimoto, Takeshi, Shirasaki, Yasuhiro, Ikegami, Akira
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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