Automatic kerf offset mapping and correction system for laser dicing

Embodiments of the present disclosure include methods of determining scribing offsets in a hybrid laser scribing and plasma dicing process. In an embodiment, the method comprises forming a mask above a semiconductor wafer. In an embodiment, the semiconductor wafer comprises a plurality of dies separ...

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Hauptverfasser: Abhinand, Sai, Papanu, James S, Park, Jungrae, Tan, Zavier Zai Yeong, Balakrishnan, Karthik
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creator Abhinand, Sai
Papanu, James S
Park, Jungrae
Tan, Zavier Zai Yeong
Balakrishnan, Karthik
description Embodiments of the present disclosure include methods of determining scribing offsets in a hybrid laser scribing and plasma dicing process. In an embodiment, the method comprises forming a mask above a semiconductor wafer. In an embodiment, the semiconductor wafer comprises a plurality of dies separated from each other by streets. In an embodiment, the method further comprises patterning the mask and the semiconductor wafer with a laser scribing process. In an embodiment, the patterning provides openings in the streets. In an embodiment, the method further comprises removing the mask, and measuring scribing offsets of the openings relative to the streets.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Automatic kerf offset mapping and correction system for laser dicing
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