Grating replication using helmets and topographically-selective deposition

Embodiments include an interconnect structure and methods of forming such an interconnect structure. In an embodiment, the interconnect structure comprises a first interlayer dielectric (ILD) and a first interconnect layer with a plurality of first conductive traces partially embedded in the first I...

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Bibliographische Detailangaben
Hauptverfasser: Hourani, Rami, Chandhok, Manish, Reshotko, Miriam, Lin, Kevin, Naskar, Sudipto
Format: Patent
Sprache:eng
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