Method of forming a semiconductor device

A method of forming a semiconductor device includes forming a trench in a semiconductor body; at least partially filling the trench with a filling material; introducing dopants into a portion of the filling material; and applying a first thermal processing to the semiconductor body to spread the dop...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Ploss, Reinhard, Schulze, Hans-Joachim
Format: Patent
Sprache:eng
Schlagworte:
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