Methods and apparatus for reducing defects in preclean chambers

Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specif...

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Hauptverfasser: Wada, Yuichi, Babu, Sarath, Jupudi, Ananthkrishna, Wei, Junqi, Teo, Kok Seong, Zhang, Kang, Ow, Yueh Sheng, Tan, Kok Wei
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creator Wada, Yuichi
Babu, Sarath
Jupudi, Ananthkrishna
Wei, Junqi
Teo, Kok Seong
Zhang, Kang
Ow, Yueh Sheng
Tan, Kok Wei
description Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specific attachment points are spaced apart to produce an amount of flexibility based on a malleability of the metallic material. The amount of flexibility ranges from approximately 2.5 to approximately 4.5.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Methods and apparatus for reducing defects in preclean chambers
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