Device, apparatus, and method for semiconductor transfer

A device, apparatus, and method for semiconductor transfer are provided. A transfer substrate is controlled to be moved to be above the target substrate. An infrared emitting portion emits infrared signals to position a semiconductor on a target substrate. After a second magnetic portion picks up th...

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Bibliographische Detailangaben
Hauptverfasser: Lin, Chien-hung, Wang, Ying-chi, Liu, Cheng-ming, Kung, Li-wei, Wei, Qiyuan
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A device, apparatus, and method for semiconductor transfer are provided. A transfer substrate is controlled to be moved to be above the target substrate. An infrared emitting portion emits infrared signals to position a semiconductor on a target substrate. After a second magnetic portion picks up the semiconductor from the target substrate, a controller outputs a first control current to a first electromagnetic portion to cause the first electromagnetic portion to generate an electromagnetic force, to control the second magnetic portion to adjust a position of the picked-up semiconductor relative to the welding position on the target substrate, where adjusting the position of the picked up semiconductor includes horizontal adjustment.