Advanced lithography and self-assembled devices

Advanced lithography techniques including sub-10 nm pitch patterning and structures resulting therefrom are described. Self-assembled devices and their methods of fabrication are described.

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Bibliographische Detailangaben
Hauptverfasser:	Gstrein, Florian, Sivakumar, Swaminathan, Tan, Elliot N, Lin, Kevin L, Chandhok, Manish, Nyhus, Paul A, Schenker, Richard E, Krysak, Marie, Bristol, Robert L, Blackwell, James M, Wallace, Charles H, Ward, Curtis W
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Advanced lithography techniques including sub-10 nm pitch patterning and structures resulting therefrom are described. Self-assembled devices and their methods of fabrication are described.