Fabrication method of holographic security label
Disclosed herein is a method that combines two different hologram origination processes in a single photoresist layer by using an interlayer to transfer structures exposed by electron beam lithography into overlapped with dot-matrix hologram areas, and fabricated holographic structures are replicate...
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| creator | Fataraite-Urboniene, Egle Klinavicius, Tomas Juodenas, Mindaugas Grigaliunas, Viktoras Jucius, Dalius Andrulevicius, Mindaugas Tamulevicius, Sigitas Narmontas, Pranas Tamulevicius, Tomas |
| description | Disclosed herein is a method that combines two different hologram origination processes in a single photoresist layer by using an interlayer to transfer structures exposed by electron beam lithography into overlapped with dot-matrix hologram areas, and fabricated holographic structures are replicated in multilayer polymer films. Dot-matrix technique is low cost process, which has high origination speed and can be used for the patterning of large areas of holograms with high diffraction efficiency. Electron beam lithography allows the formation of high resolution structures. The method allows combining these two technologies so that the final security device could contain electron beam patterned high resolution diffraction gratings, computer generated holograms, as well as dot-matrix laser patterned large hologram areas with high diffraction efficiency, providing an increased level of protection. |
| format | Patent |
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Dot-matrix technique is low cost process, which has high origination speed and can be used for the patterning of large areas of holograms with high diffraction efficiency. Electron beam lithography allows the formation of high resolution structures. 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Dot-matrix technique is low cost process, which has high origination speed and can be used for the patterning of large areas of holograms with high diffraction efficiency. Electron beam lithography allows the formation of high resolution structures. The method allows combining these two technologies so that the final security device could contain electron beam patterned high resolution diffraction gratings, computer generated holograms, as well as dot-matrix laser patterned large hologram areas with high diffraction efficiency, providing an increased level of protection.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BOOK COVERS</subject><subject>BOOKBINDING</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDEDFOR</subject><subject>ELECTROGRAPHY</subject><subject>FILES</subject><subject>HOLOGRAPHIC PROCESSES OR APPARATUS</subject><subject>HOLOGRAPHY</subject><subject>LOOSE LEAVES</subject><subject>MATERIALS THEREFOR</subject><subject>MOVABLE-STRIP WRITING OR READING APPARATUS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITYFEATURES</subject><subject>PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOTOTHERWISE PROVIDED FOR</subject><subject>SPECIAL PRINTED MATTER</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBwS0wqykxOLMnMz1PITS3JyE9RyE9TyMjPyU8vSizIyExWKE5NLi3KLKlUyElMSs3hYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxocGGhhYmZhYWFk5GxsSoAQB7wCvD</recordid><startdate>20231219</startdate><enddate>20231219</enddate><creator>Fataraite-Urboniene, Egle</creator><creator>Klinavicius, Tomas</creator><creator>Juodenas, Mindaugas</creator><creator>Grigaliunas, Viktoras</creator><creator>Jucius, Dalius</creator><creator>Andrulevicius, Mindaugas</creator><creator>Tamulevicius, Sigitas</creator><creator>Narmontas, Pranas</creator><creator>Tamulevicius, Tomas</creator><scope>EVB</scope></search><sort><creationdate>20231219</creationdate><title>Fabrication method of holographic security label</title><author>Fataraite-Urboniene, Egle ; 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Dot-matrix technique is low cost process, which has high origination speed and can be used for the patterning of large areas of holograms with high diffraction efficiency. Electron beam lithography allows the formation of high resolution structures. The method allows combining these two technologies so that the final security device could contain electron beam patterned high resolution diffraction gratings, computer generated holograms, as well as dot-matrix laser patterned large hologram areas with high diffraction efficiency, providing an increased level of protection.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BOOK COVERS BOOKBINDING CINEMATOGRAPHY DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDEDFOR ELECTROGRAPHY FILES HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY LOOSE LEAVES MATERIALS THEREFOR MOVABLE-STRIP WRITING OR READING APPARATUS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITYFEATURES PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOTOTHERWISE PROVIDED FOR SPECIAL PRINTED MATTER TRANSPORTING |
| title | Fabrication method of holographic security label |
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