EBC layer containing boron

The disclosure describes articles having coating systems configured to inhibit or prevent crystallization of TGO at the operating temperature of the article. An article includes a substrate defining a surface; a bond coat on the surface of the substrate; a coating layer that includes a boron dopant...

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Bibliographische Detailangaben
Hauptverfasser: Harrington, Gregory John Kenneth, Golden, Robert Alexander Sean, Chamberlain, Adam Lee
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The disclosure describes articles having coating systems configured to inhibit or prevent crystallization of TGO at the operating temperature of the article. An article includes a substrate defining a surface; a bond coat on the surface of the substrate; a coating layer that includes a boron dopant configured to inhibit crystallization of amorphous silicon dioxide thermally grown oxide on the bond coat at an operating temperature of the article. By inhibiting or preventing TGO crystallization, the described coating systems may increase a useable life of the component.