System and method for radical and thermal processing of substrates

The present disclosure provides systems and methods for processing channel structures of substrates that include positioning the substrate in a first processing chamber having a first processing volume. The substrate includes a channel structure with high aspect ratio features having aspect ratios g...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Sharma, Shashank, Spuller, Matthew, Zhang, Xinming, Mayur, Abhilash J, Tam, Norman L
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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