Method for pattern reduction using a staircase spacer

Devices are made by self-aligned quad pitch patterning (SAQP), staircase patterning and double staircase patterning. Methods for making devices by self-aligned quad pitch patterning (SAQP) use a single spacer in the process. Methods for making devices by staircase patterning and double staircase pat...

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Bibliographische Detailangaben
Hauptverfasser: Fulford, Daniel, Devilliers, Anton J
Format: Patent
Sprache:eng
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