Metal structures, devices, and methods

Provided herein are metal structures that may include a cobalt alloy, a nickel alloy, or nickel, as well as related devices and methods. The metal structures may be formed by chemical vapor deposition (CVD), and may include trace amounts of precursor materials used during the CVD process.

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Bibliographische Detailangaben
Hauptverfasser: McSwiney, Michael, Farmer, Jason, Zierath, Daniel J, Chowdhury, Akm Shaestagir
Format: Patent
Sprache:eng
Schlagworte:
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