Substrate treating apparatus
An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit dispose...
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| creator | Bang, Byungsun Lee, Muhyeon Choi, Jungbong Na, Seung Eun Choi, Ye Jin Kim, Kyounghwan Yun, Kangseop Park, Gui Su Lee, Youngil |
| description | An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11765793B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11765793B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11765793B23</originalsourceid><addsrcrecordid>eNrjZJAJLk0qLilKLElVKClKTSzJzEtXSCwoSASKlBbzMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL40GBDQ3MzU3NLYycjY2LUAADUOyRx</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Substrate treating apparatus</title><source>esp@cenet</source><creator>Bang, Byungsun ; Lee, Muhyeon ; Choi, Jungbong ; Na, Seung Eun ; Choi, Ye Jin ; Kim, Kyounghwan ; Yun, Kangseop ; Park, Gui Su ; Lee, Youngil</creator><creatorcontrib>Bang, Byungsun ; Lee, Muhyeon ; Choi, Jungbong ; Na, Seung Eun ; Choi, Ye Jin ; Kim, Kyounghwan ; Yun, Kangseop ; Park, Gui Su ; Lee, Youngil</creatorcontrib><description>An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230919&DB=EPODOC&CC=US&NR=11765793B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230919&DB=EPODOC&CC=US&NR=11765793B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Bang, Byungsun</creatorcontrib><creatorcontrib>Lee, Muhyeon</creatorcontrib><creatorcontrib>Choi, Jungbong</creatorcontrib><creatorcontrib>Na, Seung Eun</creatorcontrib><creatorcontrib>Choi, Ye Jin</creatorcontrib><creatorcontrib>Kim, Kyounghwan</creatorcontrib><creatorcontrib>Yun, Kangseop</creatorcontrib><creatorcontrib>Park, Gui Su</creatorcontrib><creatorcontrib>Lee, Youngil</creatorcontrib><title>Substrate treating apparatus</title><description>An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC HEATING</subject><subject>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAJLk0qLilKLElVKClKTSzJzEtXSCwoSASKlBbzMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL40GBDQ3MzU3NLYycjY2LUAADUOyRx</recordid><startdate>20230919</startdate><enddate>20230919</enddate><creator>Bang, Byungsun</creator><creator>Lee, Muhyeon</creator><creator>Choi, Jungbong</creator><creator>Na, Seung Eun</creator><creator>Choi, Ye Jin</creator><creator>Kim, Kyounghwan</creator><creator>Yun, Kangseop</creator><creator>Park, Gui Su</creator><creator>Lee, Youngil</creator><scope>EVB</scope></search><sort><creationdate>20230919</creationdate><title>Substrate treating apparatus</title><author>Bang, Byungsun ; Lee, Muhyeon ; Choi, Jungbong ; Na, Seung Eun ; Choi, Ye Jin ; Kim, Kyounghwan ; Yun, Kangseop ; Park, Gui Su ; Lee, Youngil</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11765793B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC HEATING</topic><topic>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Bang, Byungsun</creatorcontrib><creatorcontrib>Lee, Muhyeon</creatorcontrib><creatorcontrib>Choi, Jungbong</creatorcontrib><creatorcontrib>Na, Seung Eun</creatorcontrib><creatorcontrib>Choi, Ye Jin</creatorcontrib><creatorcontrib>Kim, Kyounghwan</creatorcontrib><creatorcontrib>Yun, Kangseop</creatorcontrib><creatorcontrib>Park, Gui Su</creatorcontrib><creatorcontrib>Lee, Youngil</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Bang, Byungsun</au><au>Lee, Muhyeon</au><au>Choi, Jungbong</au><au>Na, Seung Eun</au><au>Choi, Ye Jin</au><au>Kim, Kyounghwan</au><au>Yun, Kangseop</au><au>Park, Gui Su</au><au>Lee, Youngil</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate treating apparatus</title><date>2023-09-19</date><risdate>2023</risdate><abstract>An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Substrate treating apparatus |
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