Membrane for EUV lithography

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consistin...

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Hauptverfasser:	Van Der Zande, Willem Joan, Péter, Mária, Blauw, Michiel Alexander, Janssen, Paul, Voorthuijzen, Willem-Pieter, Verburg, Antonius Willem, Vermeulen, Johannes Petrus Martinus Bernardus, Zdravkov, Aleksandar Nikolov, Abegg, Erik Achilles, Brouns, Derk Servatius Gertruda, Maxim, Nicolae, Schuh, Nadja, Nikipelov, Andrey, Van Zwol, Pieter-Jan, Van De Kerkhof, Marcus Adrianus, Kruizinga, Matthias, Lenderink, Egbert, Banerjee, Nirupam, Rispens, Gijsbert, Nasalevich, Maxim Aleksandrovich, Piliego, Claudia, Vles, David Ferdinand, Notenboom, Arnoud Willem
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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