Method for etching insulating layer, method for manufacturing display device using the same, and display device

A method for etching an insulating layer includes: sequentially forming a first gate insulating layer, an amorphous silicon layer, a first interlayer insulating layer, and a second interlayer insulating layer on a substrate; applying a photoresist on the second interlayer insulating layer, and patte...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Cho, Sung Won, Kim, Dae Soo, Jeong, Yu-Gwang
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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