Method for determining corrections for lithographic apparatus

A method for determining a correction for an apparatus used in a process of patterning substrates, the method including: obtaining a group structure associated with a processing history and/or similarity in fingerprint of to be processed substrates; obtaining metrology data associated with a plurali...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Rehman, Samee Ur, Werkman, Roy, Cheng, Yana, Hastings, Simon Philip Spencer, Harutyunyan, Davit, Ziebarth, Jeffrey Thomas, Lin, Chenxi, Deckers, David Frans Simon
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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