Semiconductor apparatus including a phase change material layer having a first and a second chalcogen layer

Semiconductor unit devices may be arranged between a first insulating layer and a second insulating layer that are apart from each other in a direction normal to a substrate. Each of the semiconductor unit devices may include a selection device layer and a phase change material layer that extend sid...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Yang, Kiyeon, Lee, Changseung, Ahn, Dongho
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Yang, Kiyeon
Lee, Changseung
Ahn, Dongho
description Semiconductor unit devices may be arranged between a first insulating layer and a second insulating layer that are apart from each other in a direction normal to a substrate. Each of the semiconductor unit devices may include a selection device layer and a phase change material layer that extend side by side in a direction parallel to the substrate. The phase change material layer may have a superlattice-like structure. The phase change material layer may be arranged along a recess portion that is formed by the first insulating layer, the second insulating layer, and the selection device layer.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11744167B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11744167B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11744167B23</originalsourceid><addsrcrecordid>eNqNzDEOwjAUA9AsDAi4w-cADIWK7iAQe2GurPS3iUh_oiRF4vZQlQMw2cOzl-pZ82C1l3bU2UdCCIjIYyIr2o2tlZ5AwSAxaQPpmQZkjhaOHN4cyeA1o87GlAnSfnvi6XJaOO17ltmu1aKDS7z55Uptr5f7-bbj4BtOAZqFc_Ooi6Iqy-JYnfaHf8wH5C5BbA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Semiconductor apparatus including a phase change material layer having a first and a second chalcogen layer</title><source>esp@cenet</source><creator>Yang, Kiyeon ; Lee, Changseung ; Ahn, Dongho</creator><creatorcontrib>Yang, Kiyeon ; Lee, Changseung ; Ahn, Dongho</creatorcontrib><description>Semiconductor unit devices may be arranged between a first insulating layer and a second insulating layer that are apart from each other in a direction normal to a substrate. Each of the semiconductor unit devices may include a selection device layer and a phase change material layer that extend side by side in a direction parallel to the substrate. The phase change material layer may have a superlattice-like structure. The phase change material layer may be arranged along a recess portion that is formed by the first insulating layer, the second insulating layer, and the selection device layer.</description><language>eng</language><subject>ELECTRICITY</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230829&amp;DB=EPODOC&amp;CC=US&amp;NR=11744167B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230829&amp;DB=EPODOC&amp;CC=US&amp;NR=11744167B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Yang, Kiyeon</creatorcontrib><creatorcontrib>Lee, Changseung</creatorcontrib><creatorcontrib>Ahn, Dongho</creatorcontrib><title>Semiconductor apparatus including a phase change material layer having a first and a second chalcogen layer</title><description>Semiconductor unit devices may be arranged between a first insulating layer and a second insulating layer that are apart from each other in a direction normal to a substrate. Each of the semiconductor unit devices may include a selection device layer and a phase change material layer that extend side by side in a direction parallel to the substrate. The phase change material layer may have a superlattice-like structure. The phase change material layer may be arranged along a recess portion that is formed by the first insulating layer, the second insulating layer, and the selection device layer.</description><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzDEOwjAUA9AsDAi4w-cADIWK7iAQe2GurPS3iUh_oiRF4vZQlQMw2cOzl-pZ82C1l3bU2UdCCIjIYyIr2o2tlZ5AwSAxaQPpmQZkjhaOHN4cyeA1o87GlAnSfnvi6XJaOO17ltmu1aKDS7z55Uptr5f7-bbj4BtOAZqFc_Ooi6Iqy-JYnfaHf8wH5C5BbA</recordid><startdate>20230829</startdate><enddate>20230829</enddate><creator>Yang, Kiyeon</creator><creator>Lee, Changseung</creator><creator>Ahn, Dongho</creator><scope>EVB</scope></search><sort><creationdate>20230829</creationdate><title>Semiconductor apparatus including a phase change material layer having a first and a second chalcogen layer</title><author>Yang, Kiyeon ; Lee, Changseung ; Ahn, Dongho</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11744167B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>Yang, Kiyeon</creatorcontrib><creatorcontrib>Lee, Changseung</creatorcontrib><creatorcontrib>Ahn, Dongho</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Yang, Kiyeon</au><au>Lee, Changseung</au><au>Ahn, Dongho</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semiconductor apparatus including a phase change material layer having a first and a second chalcogen layer</title><date>2023-08-29</date><risdate>2023</risdate><abstract>Semiconductor unit devices may be arranged between a first insulating layer and a second insulating layer that are apart from each other in a direction normal to a substrate. Each of the semiconductor unit devices may include a selection device layer and a phase change material layer that extend side by side in a direction parallel to the substrate. The phase change material layer may have a superlattice-like structure. The phase change material layer may be arranged along a recess portion that is formed by the first insulating layer, the second insulating layer, and the selection device layer.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US11744167B2
source esp@cenet
subjects ELECTRICITY
title Semiconductor apparatus including a phase change material layer having a first and a second chalcogen layer
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-17T16%3A51%3A32IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Yang,%20Kiyeon&rft.date=2023-08-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11744167B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true