Systems, devices, and methods for air flow optimization including adjacent a FOUP

Systems, devices, and methods for air flow optimization including adjacent a FOUP

A system comprises a front opening universal pod (FOUP) configured to hold one or more semiconductor wafers and a load dock having a stage and a receiving portion extending above the stage. The FOUP is positioned on the stage. A fan filter unit (FFU) positioned above the load dock. An air flow optim...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Chu, Yang-Ann, Pai, Jiun-Rong, Wu, Cheng-Lung, Shiu, Yi-Fam, Liu, Hsu-Shui
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Chu, Yang-Ann
Pai, Jiun-Rong
Wu, Cheng-Lung
Shiu, Yi-Fam
Liu, Hsu-Shui
description A system comprises a front opening universal pod (FOUP) configured to hold one or more semiconductor wafers and a load dock having a stage and a receiving portion extending above the stage. The FOUP is positioned on the stage. A fan filter unit (FFU) positioned above the load dock. An air flow optimizer device is disposed on the receiving portion and under the FFU. The air flow optimizer device has an inlet opening and an outlet opening and a channel extends between the inlet opening and the outlet opening.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11735455B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11735455B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11735455B23</originalsourceid><addsrcrecordid>eNqNyr8OAUEQgPFtFIJ3GD3FORs9cdEh5-rLZHeWkds_uR2Ep0fiAVTfV_yG6lg_s5DPM7B0Z0OfwWDBk1yizeBiD8g9uC4-ICZhzy8UjgE4mO5mOZwB7RUNBQGEat8cxmrgsMs0-XWkptX2tNnNKcWWcvpakrapi2JV6qXW60X5j3kDhmw3GA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Systems, devices, and methods for air flow optimization including adjacent a FOUP</title><source>esp@cenet</source><creator>Chu, Yang-Ann ; Pai, Jiun-Rong ; Wu, Cheng-Lung ; Shiu, Yi-Fam ; Liu, Hsu-Shui</creator><creatorcontrib>Chu, Yang-Ann ; Pai, Jiun-Rong ; Wu, Cheng-Lung ; Shiu, Yi-Fam ; Liu, Hsu-Shui</creatorcontrib><description>A system comprises a front opening universal pod (FOUP) configured to hold one or more semiconductor wafers and a load dock having a stage and a receiving portion extending above the stage. The FOUP is positioned on the stage. A fan filter unit (FFU) positioned above the load dock. An air flow optimizer device is disposed on the receiving portion and under the FFU. The air flow optimizer device has an inlet opening and an outlet opening and a channel extends between the inlet opening and the outlet opening.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230822&amp;DB=EPODOC&amp;CC=US&amp;NR=11735455B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230822&amp;DB=EPODOC&amp;CC=US&amp;NR=11735455B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Chu, Yang-Ann</creatorcontrib><creatorcontrib>Pai, Jiun-Rong</creatorcontrib><creatorcontrib>Wu, Cheng-Lung</creatorcontrib><creatorcontrib>Shiu, Yi-Fam</creatorcontrib><creatorcontrib>Liu, Hsu-Shui</creatorcontrib><title>Systems, devices, and methods for air flow optimization including adjacent a FOUP</title><description>A system comprises a front opening universal pod (FOUP) configured to hold one or more semiconductor wafers and a load dock having a stage and a receiving portion extending above the stage. The FOUP is positioned on the stage. A fan filter unit (FFU) positioned above the load dock. An air flow optimizer device is disposed on the receiving portion and under the FFU. The air flow optimizer device has an inlet opening and an outlet opening and a channel extends between the inlet opening and the outlet opening.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyr8OAUEQgPFtFIJ3GD3FORs9cdEh5-rLZHeWkds_uR2Ep0fiAVTfV_yG6lg_s5DPM7B0Z0OfwWDBk1yizeBiD8g9uC4-ICZhzy8UjgE4mO5mOZwB7RUNBQGEat8cxmrgsMs0-XWkptX2tNnNKcWWcvpakrapi2JV6qXW60X5j3kDhmw3GA</recordid><startdate>20230822</startdate><enddate>20230822</enddate><creator>Chu, Yang-Ann</creator><creator>Pai, Jiun-Rong</creator><creator>Wu, Cheng-Lung</creator><creator>Shiu, Yi-Fam</creator><creator>Liu, Hsu-Shui</creator><scope>EVB</scope></search><sort><creationdate>20230822</creationdate><title>Systems, devices, and methods for air flow optimization including adjacent a FOUP</title><author>Chu, Yang-Ann ; Pai, Jiun-Rong ; Wu, Cheng-Lung ; Shiu, Yi-Fam ; Liu, Hsu-Shui</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11735455B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Chu, Yang-Ann</creatorcontrib><creatorcontrib>Pai, Jiun-Rong</creatorcontrib><creatorcontrib>Wu, Cheng-Lung</creatorcontrib><creatorcontrib>Shiu, Yi-Fam</creatorcontrib><creatorcontrib>Liu, Hsu-Shui</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Chu, Yang-Ann</au><au>Pai, Jiun-Rong</au><au>Wu, Cheng-Lung</au><au>Shiu, Yi-Fam</au><au>Liu, Hsu-Shui</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Systems, devices, and methods for air flow optimization including adjacent a FOUP</title><date>2023-08-22</date><risdate>2023</risdate><abstract>A system comprises a front opening universal pod (FOUP) configured to hold one or more semiconductor wafers and a load dock having a stage and a receiving portion extending above the stage. The FOUP is positioned on the stage. A fan filter unit (FFU) positioned above the load dock. An air flow optimizer device is disposed on the receiving portion and under the FFU. The air flow optimizer device has an inlet opening and an outlet opening and a channel extends between the inlet opening and the outlet opening.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US11735455B2
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Systems, devices, and methods for air flow optimization including adjacent a FOUP
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-05T03%3A59%3A41IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Chu,%20Yang-Ann&rft.date=2023-08-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11735455B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true