Method of fabricating semiconductor device

A semiconductor device and a method of fabricating a semiconductor device, the device including a semiconductor substrate that includes a trench defining an active region; a buried dielectric pattern in the trench; a silicon oxide layer between the buried dielectric pattern and an inner wall of the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kim, Daehyun, Im, Dong-Hyun, Lee, Kibum, We, Ju Hyung, Yoon, Sungmi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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