Processing apparatus for processing substrates of different types

According to one embodiment, a processing apparatus for processing substrates having different base shapes includes a stage comprising a first portion having a substrate facing surface and an opening extending therethough connected to a source of a cooling fluid, and a second portion located outward...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Tanabe, Mana, Sakurai, Hideaki, Takai, Kosuke
Format: Patent
Sprache:eng
Schlagworte:
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