Integrated circuit semiconductor device and method of manufacturing the same

An integrated circuit semiconductor device includes a first region including a first transistor and a second region in contact with the first region in a second direction. The first transistor includes a first active fin extending in a first direction, a first gate dielectric layer extending from th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Lee, Jonghan, Park, Jongha, Jeong, Dabok, Lee, Jaehyun, Park, Seonghwa, Woo, Jaehoon
Format: Patent
Sprache:eng
Schlagworte:
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