Method of mixing upstream and downstream current measurements for inference of the beam current at the bend of an optical element for realtime dose control

An ion implantation has an ion source and a mass analyzer configured to form and mass analyze an ion beam. A bending element is positioned downstream of the mass analyzer, and respective first and second measurement apparatuses are positioned downstream and upstream of the bending element and config...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Mollica, Rosario, Ray, Andy, DeLuca, James, Demario, Neil
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
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