Method and apparatus for non line-of-sight doping

A method of doping a substrate. The method may include providing a substrate in a process chamber. The substrate may include a semiconductor structure, and a dopant layer disposed on a surface of the semiconductor structure. The method may include maintaining the substrate at a first temperature for...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Stone, Dale K, Hatem, Christopher R, Sferlazzo, Piero, Fish, Roger
Format: Patent
Sprache:eng
Schlagworte:
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