Method and system of reducing charged particle beam write time

A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Pearman, Ryan, Guthrie, William E, Shirali, Nagesh, Fujimura, Akira, Shendre, Abhishek, Zable, Harold Robert
Format:	Patent
Sprache:	eng
Schlagworte:	CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!