Coating method and coating system

The present disclosure provides a coating method and a coating system. The coating method comprises: providing a substrate, and dropping a first liquid onto the substrate; dropping, onto the first liquid, a second liquid which is immiscible with the first liquid and has a density greater than that o...

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1. Verfasser: Xiong, Chaochao
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creator Xiong, Chaochao
description The present disclosure provides a coating method and a coating system. The coating method comprises: providing a substrate, and dropping a first liquid onto the substrate; dropping, onto the first liquid, a second liquid which is immiscible with the first liquid and has a density greater than that of the first liquid; and rotating the substrate, such that the first liquid is diffused on the surface of the substrate, and the second liquid is diffused on the surface of the first liquid.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11550223B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11550223B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11550223B23</originalsourceid><addsrcrecordid>eNrjZFB0zk8sycxLV8hNLcnIT1FIzEtRSIYKFVcWl6Tm8jCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSS-NBgQ0NTUwMjI2MnI2Ni1AAAebolpQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Coating method and coating system</title><source>esp@cenet</source><creator>Xiong, Chaochao</creator><creatorcontrib>Xiong, Chaochao</creatorcontrib><description>The present disclosure provides a coating method and a coating system. The coating method comprises: providing a substrate, and dropping a first liquid onto the substrate; dropping, onto the first liquid, a second liquid which is immiscible with the first liquid and has a density greater than that of the first liquid; and rotating the substrate, such that the first liquid is diffused on the surface of the substrate, and the second liquid is diffused on the surface of the first liquid.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230110&amp;DB=EPODOC&amp;CC=US&amp;NR=11550223B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230110&amp;DB=EPODOC&amp;CC=US&amp;NR=11550223B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Xiong, Chaochao</creatorcontrib><title>Coating method and coating system</title><description>The present disclosure provides a coating method and a coating system. The coating method comprises: providing a substrate, and dropping a first liquid onto the substrate; dropping, onto the first liquid, a second liquid which is immiscible with the first liquid and has a density greater than that of the first liquid; and rotating the substrate, such that the first liquid is diffused on the surface of the substrate, and the second liquid is diffused on the surface of the first liquid.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB0zk8sycxLV8hNLcnIT1FIzEtRSIYKFVcWl6Tm8jCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSS-NBgQ0NTUwMjI2MnI2Ni1AAAebolpQ</recordid><startdate>20230110</startdate><enddate>20230110</enddate><creator>Xiong, Chaochao</creator><scope>EVB</scope></search><sort><creationdate>20230110</creationdate><title>Coating method and coating system</title><author>Xiong, Chaochao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11550223B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Xiong, Chaochao</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Xiong, Chaochao</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Coating method and coating system</title><date>2023-01-10</date><risdate>2023</risdate><abstract>The present disclosure provides a coating method and a coating system. The coating method comprises: providing a substrate, and dropping a first liquid onto the substrate; dropping, onto the first liquid, a second liquid which is immiscible with the first liquid and has a density greater than that of the first liquid; and rotating the substrate, such that the first liquid is diffused on the surface of the substrate, and the second liquid is diffused on the surface of the first liquid.</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title Coating method and coating system
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-21T11%3A12%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Xiong,%20Chaochao&rft.date=2023-01-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11550223B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true