Plasma processing systems and methods for chemical processing a substrate

A plasma processing system includes a radical source chamber including a gas inlet, an electrode coupled to a radio frequency (RF) power source, where the electrode is configured to generate radicals within the radical source chamber, and an exit for radicals generated within the radical source cham...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Ventzek, Peter, Ranjan, Alok, Ohata, Mitsunori
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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