Plasma processing device

The present invention provides a plasma processing device including a vacuum container that has controllable internal pressure, gas supply means, an electrode that is provided in the vacuum container and has an upper surface on which a substrate is placed, and an antenna that is arranged to face the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kaneko, Hirofumi, Sato, Tatsuya, Noguchi, Takeshi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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